Mack, Chris A.Chris A.MackYannuzzi, JonathanJonathanYannuzziLorusso, GianGianLorussoZidan, MohamedMohamedZidanDe Simone, DaniloDaniloDe SimoneWeldeslassie, AtakltiAtakltiWeldeslassieVandenbroeck, NadiaNadiaVandenbroeckFoubert, PhilippePhilippeFoubertBeral, ChristopheChristopheBeralCharley, Anne-LaureAnne-LaureCharley2022-12-152022-09-082022-12-152022978-1-5106-4981-10277-786XWOS:000844549800006https://imec-publications.be/handle/20.500.12860/40374Probabilistic Process Window: A new approach to focus-exposure analysisProceedings paper10.1117/12.2614445978-1-5106-4982-8WOS:000844549800006LITHOGRAPHYDEPTH