Constant voltage electromigration for advanced BEOL copper interconnects

Tang, BaojunBaojunTangCroes, KristofKristofCroesJourdain, AnneAnneJourdainBoemmels, JuergenJuergenBoemmelsTokei, ZsoltZsoltTokeiDe Wolf, IngridIngridDe WolfWilcox, EricEricWilcoxMcMullen, TimothyTimothyMcMullen2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25980Constant voltage electromigration for advanced BEOL copper interconnectsProceedings paperhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7112685