Frommhold, AndreasAndreasFrommholdFranke, Joern-HolgerJoern-HolgerFrankeMaslow, Mark J.Mark J.MaslowNafus, KathleenKathleenNafusRispens, GijsbertGijsbertRispens2022-06-282021-12-022022-06-2820210277-786Xhttps://imec-publications.be/handle/20.500.12860/38523Pupil optimization for after etch defectivity: what imaging metrics matter?Proceedings paper10.1117/12.2600967