Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on Si wafer surfaces

De Witte, HildeHildeDe WitteDe Gendt, StefanStefanDe GendtDouglas, M.M.DouglasConard, ThierryThierryConardKenis, KarineKarineKenisMertens, PaulPaulMertensVandervorst, WilfriedWilfriedVandervorstGijbels, RenaatRenaatGijbels2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4289Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on Si wafer surfacesJournal article