De-process and physical characterization of HfO2 based resistive memory as studied by C-AFM

Celano, UmbertoUmbertoCelanoChen, YangyinYangyinChenWouters, DirkDirkWoutersJurczak, GosiaGosiaJurczakVandervorst, WilfriedWilfriedVandervorst2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20427De-process and physical characterization of HfO2 based resistive memory as studied by C-AFMMeeting abstract