ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

Mulkens, J.J.MulkensStoeldraijer, J.J.StoeldraijerDavies, G.G.DaviesDierichs, M.M.DierichsHeskamp, B.B.HeskampMoers, M. H.M. H.MoersGeorge, R. A.R. A.GeorgeRoempp, O.O.RoemppGlatzel, H.H.GlatzelWagner, C.C.WagnerPollers, IngridIngridPollersJaenen, PatrickPatrickJaenen2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3689ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodesProceedings paper