Kaneda, YukioYukioKanedaNye, RachelRachelNyeMarques, EstebanEstebanMarquesArmini, SilviaSilviaArminiDelabie, AnneliesAnneliesDelabievan Setten, MichielMichielvan SettenPourtois, GeoffreyGeoffreyPourtois2023-08-022023-06-282023-07-262023-08-0220231932-7447WOS:001006309900001https://imec-publications.be/handle/20.500.12860/42104A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer DepositionJournal article10.1021/acs.jpcc.3c00965WOS:001006309900001Materials scienceHYDROXYL-GROUPSSURFACEDENSITYSIO2SILICAArea selective depositionTi oxideModeling