Validation of vapor phase decomposition - Total reflection X-ray fluorescence spectrometry for metallic contamination analysis of Si wafers

De Gendt, StefanStefanDe GendtVinckier, ChrisChrisVinckierHellin, DavidDavidHellin2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7406Validation of vapor phase decomposition - Total reflection X-ray fluorescence spectrometry for metallic contamination analysis of Si wafersOral presentation