e-beam metrology of thin resist for high NA EUVL

Lorusso, GianGianLorussoDe Simone, DaniloDaniloDe SimoneZidan, MohamedMohamedZidanSeveri, JorenJorenSeveriMoussa, AlainAlainMoussaDey, BappadityaBappadityaDeyHalder, SandipSandipHalderGoldenshtein, AlexAlexGoldenshteinHouchens, KevinKevinHouchensSantoro, GaetanoGaetanoSantoroFischer, DanielDanielFischerMuellender, AngelikaAngelikaMuellenderMack, ChrisChrisMackKondo, TsuyoshiTsuyoshiKondoShohjoh, TomoyasuTomoyasuShohjohIkota, MasamiMasamiIkotaCharley, Anne-LaureAnne-LaureCharleyDe Gendt, StefanStefanDe GendtLeray, PhilippePhilippeLeray2023-07-102023-05-072023-07-1020230021-4922WOS:000971709300001https://imec-publications.be/handle/20.500.12860/41574e-beam metrology of thin resist for high NA EUVLJournal article review10.35848/1347-4065/acc3a4WOS:000971709300001