Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM

Kim, Young-ChangYoung-ChangKimVandenberghe, GeertGeertVandenbergheVerhaegen, StafStafVerhaegenRonse, KurtKurtRonse2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6480Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSMProceedings paper