Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson Highlands chamber

Mannaert, GeertGeertMannaertVan Cauwenberghe, M.M.Van CauwenbergheSchmidt, MichaelMichaelSchmidtVan Aelst, JokeJokeVan AelstHendrickx, DirkDirkHendrickxStucchi, MicheleMicheleStucchiConard, ThierryThierryConardVanhaelemeersch, SergeSergeVanhaelemeerschBoullart, WernerWernerBoullart2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6571Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson Highlands chamberOral presentation