Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates

Groven, BenjaminBenjaminGrovenNalin Mehta, AnkitAnkitNalin MehtaBender, HugoHugoBenderSmets, QuentinQuentinSmetsMeersschaut, JohanJohanMeersschautFranquet, AlexisAlexisFranquetConard, ThierryThierryConardNuytten, ThomasThomasNuyttenVerdonck, PatrickPatrickVerdonckVandervorst, WilfriedWilfriedVandervorstHeyns, MarcMarcHeynsRadu, IulianaIulianaRaduCaymax, MattyMattyCaymaxDelabie, AnneliesAnneliesDelabie2021-10-252021-10-2520180734-2101https://imec-publications.be/handle/20.500.12860/30810Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substratesJournal articlehttp://avs.scitation.org/doi/full/10.1116/1.5003361