Mertens, PaulPaulMertensKim, Tae-GonTae-GonKimClaes, MartineMartineClaesLe, Quoc ToanQuoc ToanLeVereecke, GuyGuyVereeckeKesters, ElsElsKestersSuhard, SamuelSamuelSuhardPacco, AntoineAntoinePaccoLux, MarcelMarcelLuxKenis, KarineKarineKenisUrbanowicz, AdamAdamUrbanowiczTokei, ZsoltZsoltTokeiBeyer, GeraldGeraldBeyer2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/15856Challenges and novel approaches for photo resist removal and post-etch residue removal for 22 nm interconnectsProceedings paper