Lithography simulation with aerial image - variable threshold resist model

Randall, JohnJohnRandallGangala, Hareen KHareen KGangalaTritchkov, AlexanderAlexanderTritchkov2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3769Lithography simulation with aerial image - variable threshold resist modelJournal article