OPC Model Accuracy of Dry Resist Readiness for 0.55NA EUVL by using Low-n Bright Field Mask

Xu, DongboDongboXuGillijns, WernerWernerGillijnsJambaldinni, ShrutiShrutiJambaldinniHwang, SoobinSoobinHwangDe Silva, AnujaAnujaDe SilvaFenger, GermainGermainFenger2025-07-312025-07-312025978-1-5106-8636-60277-786XWOS:001517345700026https://imec-publications.be/handle/20.500.12860/45984OPC Model Accuracy of Dry Resist Readiness for 0.55NA EUVL by using Low-n Bright Field MaskProceedings paper10.1117/12.3051855978-1-5106-8637-3WOS:001517345700026