Lithographic importance of acid diffusion in chemically amplified resists

Van Steenwinckel, DavidDavidVan SteenwinckelLammers, JeroenJeroenLammersLeunissen, PeterPeterLeunissenKwinten, HansHansKwinten2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11443Lithographic importance of acid diffusion in chemically amplified resistsProceedings paper