Vermang, BartBartVermangGoverde, HansHansGoverdeLorenz, AnneAnneLorenzUruena De Castro, AngelAngelUruena De CastroVereecke, GuyGuyVereeckeMeersschaut, JohanJohanMeersschautCornagliotti, EmanueleEmanueleCornagliottiRothschild, AudeAudeRothschildJohn, JoachimJoachimJohnPoortmans, JefJefPoortmansMertens, RobertRobertMertens2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20071On the blistering of atomic layer deposited Al2O3 as Si surface passivationProceedings paper