Crystallinity and composition of Sc1-x(-y)SixP(y) silicides in annealed TiN/Sc/Si:P stacks for advanced contact applications

Pollefliet, BertBertPolleflietPorret, ClémentClémentPorretEveraert, Jean-LucJean-LucEveraertSankaran, KiroubanandKiroubanandSankaranPiao, XiaoyuXiaoyuPiaoRosseel, ErikErikRosseelConard, ThierryThierryConardImpagnatiello, AndreaAndreaImpagnatielloShimura, YosukeYosukeShimuraHoriguchi, NaotoNaotoHoriguchiLoo, RogerRogerLooVantomme, AndreAndreVantommeMerckling, ClementClementMerckling2024-09-192024-02-162024-09-1920240021-4922WOS:001158326800001https://imec-publications.be/handle/20.500.12860/43562Crystallinity and composition of Sc1-x(-y)SixP(y) silicides in annealed TiN/Sc/Si:P stacks for advanced contact applicationsJournal article10.35848/1347-4065/ad1f0dWOS:001158326800001SISILICONFILMS