Schenk, TonyTonySchenkMueller, S.S.MuellerSchroeder, UweUweSchroederMaterlik, R.R.MaterlikKersch, A.A.KerschPopovici, Mihaela IoanaMihaela IoanaPopoviciAdelmann, ChristophChristophAdelmannVan Elshocht, SvenSvenVan ElshochtMikolajick, T.T.Mikolajick2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23044Strontium doped hafnium oxide thin films: wide process window for ferroelectric memoriesProceedings paper