Charge trapping in SiOx/ZrO2 and SiOx/TiO2 gate dielectric stacks

Houssa, MichelMichelHoussaNaili, MohamedMohamedNailiHeyns, MarcMarcHeynsStesmans, AndreAndreStesmans2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5351Charge trapping in SiOx/ZrO2 and SiOx/TiO2 gate dielectric stacksJournal article