Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis

Jonckheere, RikRikJonckheereVerduijn, ErikErikVerduijnWatanabe, GentaGentaWatanabeFukugami, NorihitoNorihitoFukugamiSakata, YoYoSakataKodera, YutakaYutakaKoderaGallagher, EmilyEmilyGallagher2021-10-222021-10-222015-07https://imec-publications.be/handle/20.500.12860/25439Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysisProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2397266&resultClick=1