Zhang, FenghongFenghongZhangPollentier, IvanIvanPollentierEliat, AstridAstridEliatDelvaux, ChristieChristieDelvauxRonse, KurtKurtRonse2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4969SiON ARC: Material characterization and implication in lithographic processProceedings paper