Understanding adhesion failure in low-k dielectric stacks during chemical mechanical polishing

Iacopi, FrancescaFrancescaIacopiDegryse, DominiekDominiekDegryseVos, IngridIngridVosPatz, MichaelMichaelPatzMaex, KarenKarenMaex2021-10-152021-10-152004-01https://imec-publications.be/handle/20.500.12860/9082Understanding adhesion failure in low-k dielectric stacks during chemical mechanical polishingProceedings paper