Langner, AndreasAndreasLangnerEkinci, YasinYasinEkinciGronheid, RoelRoelGronheidWang, SupingSupingWangvan Setten, EelcoEelcovan Settenvan Ingen-Schenau, KoenKoenvan Ingen-SchenauFeenstra, KeesKeesFeenstraMallmann, JoergJoergMallmannMaas, RaymondRaymondMaas2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17428Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithographyProceedings paper