Ercken, MoniqueMoniqueErckenGronheid, RoelRoelGronheidPollentier, IvanIvanPollentierLeray, PhilippePhilippeLeray2021-10-162021-10-162007-05https://imec-publications.be/handle/20.500.12860/12128Immersion photoresist qualificationJournal article