Resist surface investigations for reduction of line-edge-roughness in top surface imaging technology

Sugihara, TakashiTakashiSugiharaVan Roey, FriedaFriedaVan RoeyGoethals, MiekeMiekeGoethalsRonse, KurtKurtRonseVan den hove, LucLucVan den hove2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3870Resist surface investigations for reduction of line-edge-roughness in top surface imaging technologyJournal article