Direct comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resists

Perera, Rupert c.Rupert c.PereraPollentier, IvanIvanPollentierUnderwood, James H.James H.UnderwoodHouser, David C.David C.Houser2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21282Direct comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resistsOral presentation