Characterization and integration of a new Si-O-C film deposited by CVD

Alves Donaton, RicardoRicardoAlves DonatonStruyf, HerbertHerbertStruyfLepage, MurielMurielLepageCoenegrachts, BartBartCoenegrachtsStucchi, MicheleMicheleStucchiDe Roest, DavidDavidDe RoestBaklanov, MikhaïlMikhaïlBaklanovVanhaelemeersch, SergeSergeVanhaelemeerschMaex, KarenKarenMaexGaillard, F.F.GaillardXia, L. Q.L. Q.XiaLim, T. H.T. H.LimGotuaco, M.M.GotuacoYieh, E.E.YiehVan Autryve, LucLucVan Autryve2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5263Characterization and integration of a new Si-O-C film deposited by CVDProceedings paper