Hoffmann, ThomasThomasHoffmannStorms, GreetGreetStormsVandenbroeck, NadiaNadiaVandenbroeckDelvaux, ChristieChristieDelvauxErcken, MoniqueMoniqueErckenPollentier, IvanIvanPollentierRonse, KurtKurtRonseTakuji, TadaTadaTakujiFelten, FrankFrankFeltenWong, EvelynEvelynWong2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6400Interim investigation of CD-SEM resist shrinkage in 193nm lithographyOral presentation