Lin, ChenxiChenxiLinZou, YiYiZouAmbesi, DavideDavideAmbesiDruzhinina, TamaraTamaraDruzhininaWuister, SanderSanderWuisterKarageorgos, IoannisIoannisKarageorgosRyckaert, JulienJulienRyckaertRaghavan, PraveenPraveenRaghavanGronheid, RoelRoelGronheid2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25563Feasibility study of grapho-epitaxy DSA for complementing EUV lithography beyond N10Proceedings paper