Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch

Winroth, GustafGustafWinrothGronheid, RoelRoelGronheidKim, Tae-GonTae-GonKimMertens, PaulPaulMertens2021-10-202021-10-2020120167-9317https://imec-publications.be/handle/20.500.12860/21853Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitchJournal articlehttp://www.sciencedirect.com/science/article/pii/S0167931712003383