Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson HighlandsTM chamber

Mannaert, GeertGeertMannaertVan Cauwenberghe, MarcMarcVan CauwenbergheSchmidt, M.O.M.O.SchmidtVan Aelst, JokeJokeVan AelstHendrickx, DirkDirkHendrickxStucchi, MicheleMicheleStucchiConard, ThierryThierryConardVanhaelemeersch, SergeSergeVanhaelemeerschBoullart, WernerWernerBoullart2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7858Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson HighlandsTM chamberProceedings paper