Le, Quoc ToanQuoc ToanLeKesters, ElsElsKestersPrager, LutzLutzPragerLux, MarcelMarcelLuxVereecke, GuyGuyVereecke2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15679Removal of post-etch 193 nm photoresist in porous low-k dielectric patterning using UV irradiation and wet chemistriesProceedings paper