Characterization of charge trapping in SiO2/Al2O3 dielectric stacks by pulsed CV-technique

Puzzilli, G.G.PuzzilliGovoreanu, BogdanBogdanGovoreanuIrrera, F.F.IrreraRosmeulen, MaartenMaartenRosmeulenVan Houdt, JanJanVan Houdt2021-10-162021-10-162007-06https://imec-publications.be/handle/20.500.12860/12744Characterization of charge trapping in SiO2/Al2O3 dielectric stacks by pulsed CV-techniqueJournal article