Dry etch challenges in a 20 nm half-pitch single damascene spacer-defined patterning scheme

Kunnen, EddyEddyKunnenVersluijs, JankoJankoVersluijsAlaerts, WilfriedWilfriedAlaertsSiew, Yong KongYong KongSiewStruyf, HerbertHerbertStruyfBeyer, GeraldGeraldBeyer2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17411Dry etch challenges in a 20 nm half-pitch single damascene spacer-defined patterning schemeMeeting abstract