Electrostatic potential perturbation at the polycrystalline Si/HfO2 interface

Afanasiev, ValeriValeriAfanasievStesmans, AndreAndreStesmansPantisano, LuigiLuigiPantisanoP. J. Chen,P. J. Chen2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10003Electrostatic potential perturbation at the polycrystalline Si/HfO2 interfaceJournal article