Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures

Carbonell, LaureLaureCarbonellVolders, HennyHennyVoldersHeylen, NancyNancyHeylenKellens, KristofKristofKellensTokei, ZsoltZsoltTokeiHendrickx, DirkDirkHendrickxStruyf, HerbertHerbertStruyfClaes, MartineMartineClaesVersluijs, JankoJankoVersluijsVan Besien, ElsElsVan BesienCaluwaerts, RudyRudyCaluwaertsCockburn, AndrewAndrewCockburnGravey, VirginieVirginieGraveyShah, KavitaKavitaShahAl-Bayati, AmirAmirAl-BayatiFu, X.X.FuLubben, D.D.LubbenSundarrajan, A.A.SundarrajanBeyer, GeraldGeraldBeyer2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15064Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structuresProceedings paper