Quantification of high-K nanolayers for semiconductor applications using synchrotron radiation and calibrated instrumentation

Mueller, MatthiasMatthiasMuellerHoenicke, PhilippPhilippHoenickeDetlefs, BlankaBlankaDetlefsFleischmann, ClaudiaClaudiaFleischmannVandervorst, WilfriedWilfriedVandervorstBeckhoff, BurkhardBurkhardBeckhoff2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24283Quantification of high-K nanolayers for semiconductor applications using synchrotron radiation and calibrated instrumentationMeeting abstract