Meuris, MarcMarcMeurisMertens, PaulPaulMertensSchmidt, HaraldHaraldSchmidtHurd, TraceTraceHurdLi, LiLiLiHeyns, MarcMarcHeynsJonckx, FrankyFrankyJonckxMaex, KarenKarenMaexSchild, R.R.SchildLocke, K.K.LockeKozak, M.M.Kozak2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/483New drying techology for advanced cleaning in IC manufacturingProceedings paper