Alves Donaton, RicardoRicardoAlves DonatonLokere, K.K.LokereVerbeeck, RitaRitaVerbeeckMaex, KarenKarenMaex2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/633Etching of CoSi2 in HF-based solutionsJournal article