Advanced CD-SEM solution for edge placement error characterization of BEOL pitch 32nm metal layer

Charley, Anne-LaureAnne-LaureCharleyLeray, PhilippePhilippeLerayLorusso, GianGianLorussoSutani, T.T.SutaniTakemasa, Y.Y.Takemasa2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30392Advanced CD-SEM solution for edge placement error characterization of BEOL pitch 32nm metal layerProceedings paperhttps://doi.org/10.1117/12.2298408