Optimization of reactive ion etching of Al0.48In0.52As in CH4/H2 by the experimental design method

Carpi, EnioEnioCarpiVan Hove, MarleenMarleenVan HoveAlay, Josep LluisJosep LluisAlayVan Rossum, MarcMarcVan Rossum2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/546Optimization of reactive ion etching of Al0.48In0.52As in CH4/H2 by the experimental design methodJournal article