Low-k integration: Gas screening for cryogenic etching and damage mitigation

Chanson, RomainRomainChansonDussart, RemiRemiDussartTillocher, ThomasThomasTillocherLefaucheux, PhilippePhilippeLefaucheuxDussarrat, ChristianChristianDussarratde Marneffe, Jean-FrancoisJean-Francoisde Marneffe2021-10-272021-10-2720192095-0187https://imec-publications.be/handle/20.500.12860/32687Low-k integration: Gas screening for cryogenic etching and damage mitigationJournal articlehttps://doi.org/10.1007/s11705-019-1820-5