Lithography options for the 32nm half pitch node and their implications on resist and material technology

Gronheid, RoelRoelGronheidHendrickx, EricEricHendrickxWiaux, VincentVincentWiauxMaenhoudt, MireilleMireilleMaenhoudtGoethals, MiekeMiekeGoethalsVandenberghe, GeertGeertVandenbergheRonse, KurtKurtRonse2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12233Lithography options for the 32nm half pitch node and their implications on resist and material technologyProceedings paper