Dutta, ShibeshShibeshDuttaSankaran, KiroubanandKiroubanandSankaranSoulie, Jean-PhilippeJean-PhilippeSoulieKundu, ShreyaShreyaKunduOpsomer, KarlKarlOpsomerDetavernier, ChristopheChristopheDetavernierChen, LinghanLinghanChenFounta, ValeriaValeriaFountaDe Wolf, IngridIngridDe Wolfvan de Vondel, JorisJorisvan de VondelPourtois, GeoffreyGeoffreyPourtoisSwerts, JohanJohanSwertsPark, SeonghoSeonghoParkTokei, ZsoltZsoltTokeiAdelmann, ChristophChristophAdelmann2026-06-112026-06-1120252574-0970https://imec-publications.be/handle/20.500.12860/59669engResistivity Scaling of Rhodium Nanowires for Advanced Interconnect ApplicationsJournal article10.1021/acsanm.5c02653WOS:001573300300001CHEMICAL-VAPOR-DEPOSITIONTHIN-FILMSPOLYCRYSTALLINE FILMSREFLECTIONGROWTHMODEL