Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures

Carbonell, LaureLaureCarbonellVolders, HennyHennyVoldersHeylen, NancyNancyHeylenKellens, KristofKristofKellensTokei, ZsoltZsoltTokeiHendrickx, DirkDirkHendrickxStruyf, HerbertHerbertStruyfVandervorst, AlainAlainVandervorstClaes, MartineMartineClaesLux, MarcelMarcelLuxVersluijs, JankoJankoVersluijsAlaerts, WilfriedWilfriedAlaertsVan Besien, ElsElsVan BesienDeweerdt, BrunoBrunoDeweerdtVaes, JanJanVaesCaluwaerts, RudyRudyCaluwaertsCockburn, AndrewAndrewCockburnGravey, VirginieVirginieGraveyShah, KavitaKavitaShahAl-Bayati, A.A.Al-BayatiFu, X.X.FuLubben, D.D.LubbenSundarrajan, A.A.SundarrajanBeyer, GeraldGeraldBeyer2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13473Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structuresMeeting abstract