Passivation of (100)Ge/GeO2/high-k gate stacks using thermal oxide treatments

Bellenger, FlorenceFlorenceBellengerHoussa, MichelMichelHoussaDelabie, AnneliesAnneliesDelabieAfanasiev, ValeriValeriAfanasievConard, ThierryThierryConardCaymax, MattyMattyCaymaxMeuris, MarcMarcMeurisDe Meyer, KristinKristinDe MeyerHeyns, MarcMarcHeyns2021-10-172021-10-1720080013-4651https://imec-publications.be/handle/20.500.12860/13365Passivation of (100)Ge/GeO2/high-k gate stacks using thermal oxide treatmentsJournal article