Park, JuhaeJuhaeParkLee, Sung-GyuSung-GyuLeeVesters, YannickYannickVestersSeveri, JorenJorenSeveriMyungwoong, KimKimMyungwoongDe Simone, DaniloDaniloDe SimoneOh, Hye-KeunHye-KeunOhHur, Su-MiSu-MiHur2021-10-272021-10-2720192073-4360https://imec-publications.be/handle/20.500.12860/33748Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formationJournal articlehttps://doi.org/10.3390/polym11121923