MOCVD of bismuth oxides: transport properties and deposition mechanisme of the Bi(C6H5)3 precursor

Bedoya, C.C.BedoyaCondorelli, G.G.G.G.CondorelliAnastasi, G.G.AnastasiBaeri, A.A.BaeriScerra, F.F.ScerraFragala, I.L.I.L.FragalaLisoni, JuditJuditLisoniWouters, DirkDirkWouters2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8554MOCVD of bismuth oxides: transport properties and deposition mechanisme of the Bi(C6H5)3 precursorJournal article