Local mechanical stress induced defects for Ti and Co/Ti silicidation in sub-0.25μm MOS-technologies

Steegen, AnAnSteegenMaex, KarenKarenMaexDe Wolf, IngridIngridDe Wolf2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/2974Local mechanical stress induced defects for Ti and Co/Ti silicidation in sub-0.25μm MOS-technologiesProceedings paper